FABRICATE AND ASSEMBLE MACHINED SEMICONDUCTOR COMPONENTS
COMPONENTS WHICH ARE UTILIZED IN-PROCESSES SUCH AS PHOTOLITHOGRAPHY, SUBSTRATE ETCHING, CHEMICAL VAPOR DEPOSITION, ION IMPLANTATION AND OTHER SEMICONDUCTOR WAFER PROCESSING TECHNIQUES
OUR CLEAN ROOM FACILITIES UTILIZE HEPA FILTRATION SYSTEMS TO UPHOLD AIR CLEANLINESS LEVELS AT A MAXIMUM OF 1,000 PARTICLES PER CUBIC METER
HOUSES ULTRA HIGH VACUUM CHAMBERS WITH CAPABILITIES INCLUDING RGA
MOLECULAR AND PARTICLE GRADE II BAKE OUTS
OPTIMAL ENVIRONMENT FOR ULTRA HIGH PURITY COMPONENTS